The Photopolymer Science and Technology Award No. 241100, the Outstanding Achievement Award 2024 was presented to Dr. Makoto Hanabata (Photofunctional Materials Research Co., Ltd.) for his outstanding achievements in photopolymer science and technology, “Pioneering Technology of the Novolak-Diazonaphthoquinone resist design for g-line(436nm) and i-line(365nm) photoresist platform and materials”.

The Photopolymer Science and Technology Award No. 232100, the Best Paper Award 2022, was presented to Atsunori Nakamoto, Shinji Yamakawa, Tetsuo Harada, and Takeo Watanabe (Center for EUV Lithography, Laboratory of Advanced Science and Technology for Industry, University of Hyogo) for their outstanding contribution published in Journal of Photopolymer Science and Technology, 35, (2022) 61-65, entitled “Grazing-Incidence Soft-X-ray Scattering for the Chemical Structure Size Distribution Analysis in EUV Resist”.

The Photopolymer Science and Technology Award No. 222100, the Best Paper Award 2021, was presented to Seihou Jinnai and Yutaka Ie (The Institute of Scientific and Industrial Research (SANKEN), Osaka University) for their outstanding contribution published in Journal of Photopolymer Science and Technology, 34, (2021) 285-290, entitled “Synthesis, Properties, and Photovoltaic Characteristics of Arch- and S-shaped Naphthobisthiadiazole-based Acceptors”.