Abstract
Novel alkaline developable top-coat materials containing a bulky silicon group are presented. This bulky silicon group endows transparency at 193nm wavelength and hydrophobicity to the top-coat. Good pattern profiles and negligible changes of lithographic performance are confirmed on ArF photoresists. Receding angle of this top-coat is 90o, which is the highest among alkaline developable top-coats reported to date, and only comparable by solvent soluble-typetop-coat TSP3A.
