Coating on Upconversion Emissive Nano-particles with Photocuring Resin

Kohei Soga; Aya Okada; Yu Saito; Yuji Kameyama; Tomoya Konishi

doi:10.2494/photopolymer.20.7

Kohei Soga, Aya Okada, Yu Saito, Yuji Kameyama, Tomoya Konishi

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Keywords: upconversion, photocuring, nanoparticle, coating

JOURNAL FREE ACCESS

2007 Volume 20 Issue 1 Pages 7-9

DOI https://doi.org/10.2494/photopolymer.20.7

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Abstract

A coating technology for forming a nano-thickness hydrophobic polymer on upconversion nanophoshpors was developed. A mixed resin with pentaerythritol tetraacrylate and triethyleneglycol dimethacrylate was photocured on the surface of the upconversion phosphor particles with 200 nm size to form a solid coating film with 80 nm. According to the FE-SEM observation, the particles are found to be caoted serparately each other.

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