Resist Removal by Using Wet Ozone

Journal of Photopolymer Science and Technology

Online ISSN : 1349-6336
Print ISSN : 0914-9244
ISSN-L : 0914-9244

Resist Removal by Using Wet Ozone

Hideo Horibe, Masashi Yamamoto, Tomokazu Ichikawa, Tomosumi Kamimura, Seiichi Tagawa

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Keywords: resist, removal, wet ozone, chemicals, resist implanted ions, environment

JOURNAL FREE ACCESS

2007 Volume 20 Issue 2 Pages 315-318

DOI https://doi.org/10.2494/photopolymer.20.315

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© 2007 The Society of Photopolymer Science and Technology (SPST)

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