Status and Challenges of Template Fabrication Process for UV Nanoimprint Lithography

Abstract

UV nano-imprint lithography (UV-NIL) is a promising candidate in next generation lithography due to its advantage in throughput and cost effectiveness. NIL attracts not only the field of semiconductors but also the fields of optics, storage media, bio-technology and related devices. The resolution of NIL is not limited by the light diffraction as it is in the conventional photolithography. Therefore template fabricating technology is one of the key to realize NIL processes. We resolved fine features down to half pitch (HP) 22 nm patterns on the templates with a ZEP520 resist and a spot beam electron beam (EB) writer at 100kV. In addition, three dimensional (3D) structural templates with complete relief surfaces were proposed for optical device usage, by employing gray-scale lithography. Furthermore, anti-sticking layers on the templates were microscopically characterized with scanning probe microscopy (SPM).