Journal of Photopolymer Science and Technology
Online ISSN : 1349-6336
Print ISSN : 0914-9244
ISSN-L : 0914-9244
Design of Sulfonium Compounds as a Photo-acid Generator
Tomotaka TsuchimuraKazuto ShimadaYouhei IshijiTetsunori MatsushitaToshiaki Aoai
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2007 Volume 20 Issue 5 Pages 621-625

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Abstract
Triarylsulfonium compounds with relatively higher reduction potentials by introduction of electron withdrawing groups and expansion of π-electron resonance were newly designed and synthesized. These sulfonium compounds exhibited high acid generation efficiency, which were cationic polymerization ability, by electron transfer induced photo-sensitization with dyes. The thermal stability of these compounds was investigated from a practical standpoint, and also the influence of the stability by varying the counter anion was examined. Further, these sulfonium compounds were applied to radical promoted cationic polymerization and infrared-dye induced photo-sensitization.
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© 2007 The Society of Photopolymer Science and Technology (SPST)
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