Journal of Photopolymer Science and Technology
Online ISSN : 1349-6336
Print ISSN : 0914-9244
ISSN-L : 0914-9244
Oxime Sulfonate Chemistry for Advanced Microlithography
Hitoshi YamamotoToshikage AsakuraYuichi NishimaeAkira MatsumotoJunichi TanabeJean-Luc BirbaumPeter MurerTobias HintermanMasaki Ohwa
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2007 Volume 20 Issue 5 Pages 637-642

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Abstract
Oxime sulfonate compounds are one of the important chemistry as photoacid generator for advanced lithography application and practically used in mass production of semiconductor chips. This chemistry is adjustable for various applications like g-/h-/i-line, KrF and ArF lithography. This paper describes an overview of oxime sulfonate chemistry for semiconductor resist application, including commercially available products.
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© 2007 The Society of Photopolymer Science and Technology (SPST)
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