Journal of Photopolymer Science and Technology
Online ISSN : 1349-6336
Print ISSN : 0914-9244
ISSN-L : 0914-9244
Pattern Transfer of Laterally Aligned Lamellar Domains of Diblock Copolymers
Toru Yamaguchi, Hiroshi Yamaguchi
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Keywords: lithography, self-assembly, block copolymer, graphoepitaxy
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2007 Volume 20 Issue 5 Pages 767-769

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© 2007 The Society of Photopolymer Science and Technology (SPST)
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