Journal of Photopolymer Science and Technology
Online ISSN : 1349-6336
Print ISSN : 0914-9244
ISSN-L : 0914-9244
Analysis of Interface Condition between BARC and Resist Film by FT-IR/ATR
Shingo KurodaTomohiro GotoOsamu TamadaMasakazu SanadaAkira Kawai
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2007 Volume 20 Issue 6 Pages 807-808

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Abstract

Adhesion property of an ArF resist pattern formed on bottom anti-reflection coating (BARC) is considered to be sensitive to its interface condition. We examine the interface properties by Fourier transform infrared spectroscopy (FT-IR) attenuated total reflection (ATR) technique. As a result, a sample which was treated with a primer such as HMDS mixture indicates specific spectrums. This result gives an important suggestion that an intermediate layer between the BARC layer and the ArF resist would be formed by the primer treatment. This intermediate layer would act as a factor of the adhesion property.

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© 2007 The Society of Photopolymer Science and Technology (SPST)
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