Micro Bubble Removal Depending on Glass Cleanness

Abstract

One serious problem for immersion lithography is micro bubble adhesion which is responsible for various exposure failures. In immersion lithography, it seems reasonable to suppose that organic contamination of lens surface brings about micro bubble adhesion onto them. Therefore, this study is intended as an analysis of adhesion and removal of micro bubbles on quartz surfaces by the contact angle method. We discuss the adhesion and removal behavior of micro bubble on the point of the balance model of surface energy. In the consequence, the micro bubbles are more likely to adhere to the organic contaminate on the quartz substrate. Keeping cleanness of a lens surface is necessary in order to prevent the micro bubble adhesion.