Positive-Working Photoresist Based on a First-Generation Dendrimer Consisting of 3,5-Bis(tetrahydropyranyloxy)benzyl Units

Abstract

A novel molecular glass based on tetrahydropyran (THP)-protected G1 dendrimer (3) was designed and synthesized as a positive-type chemical amplified resist. The dendrimer 3 involving a photoacid generator and an acid quencher showed a high sensitivity (D0: 33 mJ/cm²) and a high contrast (8.3), and could fabricate 3 μm line-and-space pattern with a 365 nm light (i-line) exposure tool. Moreover, a 2.38% aqueous tetramethylammonium hydroxide (TMAH) can be used as a developer.