Removal of Ion Implanted Resists with Various Acceleration Energy using Wet Ozone

Yousuke Goto; Takeshi Maruoka; Masashi Yamamoto; Hideo Horibe; Eiji Kusano; Toshinori Miura; Mituru Kekura; Seiichi Tagawa

doi:10.2494/photopolymer.22.321

Yousuke Goto, Takeshi Maruoka, Masashi Yamamoto, Hideo Horibe, Eiji Kusano, Toshinori Miura, Mituru Kekura, Seiichi Tagawa

Author information

Yousuke Goto
Research Laboratory for Integrated Technological Systems, Kanazawa Institute of Technology
Takeshi Maruoka
Research Laboratory for Integrated Technological Systems, Kanazawa Institute of Technology
Masashi Yamamoto
Research Laboratory for Integrated Technological Systems, Kanazawa Institute of Technology
Hideo Horibe
Research Laboratory for Integrated Technological Systems, Kanazawa Institute of Technology
The Institute of Scientific and Industrial Research, Osaka University
Eiji Kusano
Research Laboratory for Integrated Technological Systems, Kanazawa Institute of Technology
Toshinori Miura
Core Technology Research & Development Center, Meidensha Corporation
Mituru Kekura
Core Technology Research & Development Center, Meidensha Corporation
Seiichi Tagawa
The Institute of Scientific and Industrial Research, Osaka University

Keywords: resist, wet ozone, acceleration energy, environment

JOURNAL FREE ACCESS

2009 Volume 22 Issue 3 Pages 321-324

DOI https://doi.org/10.2494/photopolymer.22.321

Details

Abstract

We investigated the removal of ion-implanted resists with various acceleration energy using wet ozone. The resist removal rate decreased with increasing acceleration energy in B- and P-ion-implanted resists. The hardness of ion-implanted resists increased with increasing acceleration energy as a result of nanoindentation, and was simulated by Stopping and Range f Ions in Matter software (SRIM2008).

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