Journal of Photopolymer Science and Technology
Online ISSN : 1349-6336
Print ISSN : 0914-9244
ISSN-L : 0914-9244
Adhesion Improvement of Perfluoro-sulfonic Acid Membrane by UV-irradiation for PEFC Performance
Fumiya ShirakiYuji OshimaAkihiro OshimaMasakazu Washio
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2009 Volume 22 Issue 3 Pages 335-340

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Abstract

Perfluoro-sulfonic acid (PFSA) membranes were exposed to UV for the improvement of surface adhesion property. The photochemical effect of PFSA was evaluated by UV-visible spectroscopy. The changes of the chemical structure of UV-exposed PFSA were studied by electron spin resonance (ESR) and Fourier transform infrared (FTIR) spectroscopies. ESR spectra revealed the presence of peroxy radicals. Moreover, the results of FTIR would be indicating the decomposition of side chains of PFSA. To evaluate the adhesion properties after UV exposure, the shearing stresses of laminations were measured. The lamination of UV-exposed PFSA showed higher adhesion property than that of unexposed PFSA. A membrane electrode assembly (MEA) consisting of UV-exposed PFSA was fabricated by a hot-press method for the fuel cell operations. The obtained MEA showed higher cell performance than that of the MEA of unexposed PFSA.

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© 2009 The Society of Photopolymer Science and Technology (SPST)
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