Journal of Photopolymer Science and Technology
Online ISSN : 1349-6336
Print ISSN : 0914-9244
ISSN-L : 0914-9244
Application of Carbon Nanotube (CNT) to Photosensitive Diazo /PVA Resist
Kieko HaradaTetsuyuki TaniaiMasahiro NakadaHiroshi HamanaKiyomi MatsudaShigeru TakaharaKazuyuki Sugita
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2009 年 22 巻 3 号 p. 347-350

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Degradation temperature, D.T. of the para-substituted benzene diazo compound (SBD) incorporated with multi-walled carbon nanotube (CNT), was determined by TDA and DTA in solid. The D.T. of SBD with CNT was higher than that of SBD with C60, which was higher than that without CNT or C60. Stabilization energies of diazo compounds with CNT (1:1) and C60 (1:1) were calculated to be - 57 and -7 kJ/mol by WinMOPAC, respectively. Calculation results support the stability of diazo with CNT or C60. Photodecomposition rate of PVA resist films containing diphenyl-4-diazonium sulfate salts / formaldehyde condensate (DSR) with CNT was higher than that without CNT. It is considered DSR/PVA with CNT was photo-decomposed reductively and accelerated with the electrons evolved from CNT, absorbing light energy. Hardness of resist layers containing CNT (1/1 to diazo by weight ) was larger than that with C60, which was larger than that without CNT or C60. High durability is assumed to be caused by compact packing of the polymer chains with nanocarbons.
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© 2009 The Society of Photopolymer Science and Technology (SPST)
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