Photo-embossed Surface Relief Structures with an Increased Aspect Ratio by Addition of Kinetic Interfering Compounds

Abstract

The aspect ratio of photo-embossed relief structures has been improved significantly by addition of a reversible addition-fragmentation chain transfer (RAFT) agent, typically used for controlled radical polymerization in particular of acrylate monomers. The increase is independent of the atmospheric conditions since oxygen inhibition hardly occurs, which represents a major advantage for industrial applications of photo-embossing. The aspect ratio could be improved due to the controlled acrylate polymerization upon addition of a RAFT agent and increased by a factor of almost 10. The insensitivity to oxygen inhibition is related to the ability of the RAFT agents to form stable radicals.