Chemically Amplified Photosensitive Polyimides and Polybenzoxazoles

Ken-ichi Fukukawa; Mitsuru Ueda

doi:10.2494/photopolymer.22.761

Journal of Photopolymer Science and Technology

Online ISSN : 1349-6336
Print ISSN : 0914-9244
ISSN-L : 0914-9244

Chemically Amplified Photosensitive Polyimides and Polybenzoxazoles

Ken-ichi Fukukawa, Mitsuru Ueda

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Keywords: photosensitive polyimide, photosensitive polybenzoxazole, chemical amplification, photoacid generator, photobase generator

JOURNAL FREE ACCESS

2009 Volume 22 Issue 6 Pages 761-771

DOI https://doi.org/10.2494/photopolymer.22.761

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Abstract

Photosensitive polyimides (PSPIs) and poly(benzoxazole)s (PSPBOs) are widely utilized as protection and insulating layers in manufacturing semiconductors because of their good mechanical properties, low water absorption, and low dielectric constant. In particular, chemically amplified PSPIs and PSPBOs exhibit very high sensitivity as compared to non-chemically amplified ones. This review article reports the advances in the molecular design of PSPIs and PSPBOs, as well as their potential properties.

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