Refractive Index Lithography Materials Based on Chemically Amplified Reaction

Abstract

This article is dedicated to late Dr. Ito for his distinguished invention, fantastic technology, and warmhearted humanity
Refractive index lithography was performed on polymer films consist of a photo-acid generator (PAG), t-BOC-protected naphthazarine as an acid chromic dye. The key reaction is the chemically amplified de-protection of the t-BOC group, by which color of the material change followed by refractive index change. Naphthazarine-containing polymer was also prepared. The induced refractive index was as large as 4X10^-3, which is enough large to apply to optical waveguide fabrication.