UV Irradiation Effect on Pattern Size Shrinkage of Sol-gel Indium Tin Oxide Replicated by Nanoimprint Lithography
2010 年 23 巻 1 号 p. 39-43
詳細
2010 年 23 巻 1 号 p. 39-43
The spin-coated ITO film can be delineated by room-temperature nanoimprint lithography (RT-NIL), but the patterns disappeared after 200 ?C annealing process. To overcome the above problem, we examined 254 nm UV irradiation effect onto a spin-coated ITO film. However, this result suggests that UV irradiated pattern shrink in size. In this paper, we confirmed UV irradiation effect on pattern shrinkage of sol-gel ITO replicated by RT-NIL.
