Journal of Photopolymer Science and Technology
Online ISSN : 1349-6336
Print ISSN : 0914-9244
ISSN-L : 0914-9244
Evaluation of Curing Characteristics in UV-NIL Resist
Ryosuke SuzukiNobuji SakaiAtsushi SekiguchiYoko MatsumotoRisa TanakaYoshihiko Hirai
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2010 Volume 23 Issue 1 Pages 51-54

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Abstract

Mechanical characteristics of UV curable resist for UV nanoimprint lithography are investigated using UV rheology meter. Modulations of visco-elatic properties and thickness shrinkages in typical resists are evaluated in variation of exposure UV intensity. The mechanical modulation speed of the resist depends on the UV intensity, which affects to throughput of UV nanoimprint lithography process. To handle the characteristics universally, effective conversion time is newly introduced, which fairly expresses the resist modifications.

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© 2010 The Society of Photopolymer Science and Technology (SPST)
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