Comparison of EB Exposure Characteristics between HSQ and Calix Arene of High Resolution Negative Resist

Journal of Photopolymer Science and Technology

Online ISSN : 1349-6336
Print ISSN : 0914-9244
ISSN-L : 0914-9244

Comparison of EB Exposure Characteristics between HSQ and Calix Arene of High Resolution Negative Resist

S. Omoto, M. Okada, Y. Kang, K. Kanda, Y. Haruyama, S. Tono, S. Matsui

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Keywords: Hydrogen silsesquioxane (HSQ), Calix Arene, Electron-beam (EB), Espacer

JOURNAL FREE ACCESS

2010 Volume 23 Issue 1 Pages 97-100

DOI https://doi.org/10.2494/photopolymer.23.97

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© 2010 The Society of Photopolymer Science and Technology (SPST)

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