抄録
In the next-generation, a high throughput fine patterning process with low cost is required to fabricate various devices, which have a nanometer-scale pattern over a large area. Ultra violet nanoimprint lithography (UV-NIL) is a major breakthrough in this field because it is considerably simpler than the conventional techniques and the equipment cost of a NIL system is inexpensive. Furthermore, NIL with roll mold (Roll nanoimprint, RNIL) has received a lot of attention because of its very high throughput and high resolution. Generally, a roll mold with nano pattern is obtained by the attachment of a planar replica mold. However, the resulting roll mold has seams and this brings about a yield loss of the product. Therefore, we have developed a direct writing method using EB lithography on a rotating cylindrical substrate. In this study, we examined a fabrication method of seamless roll mold using transparent roll substrate and RNIL was carried out using a UV photo-curable resin.
