抄録
Nano structures on organic solar material are expected to improve power generation efficiency instead of bulk hetero junctions. In this study, we fabricated high aspect ratio nano structures using poly-3-hexylthiophene (P3HT) by a novel nano-imprint process. Fine structures 70-nm wide and 550-nm high were successful obtained. However, the pattern defects in the de-molding process were increased by basing on the increment of the pattern′s aspect ratio. We also investigated the relation between aspect ratio and defect yield.