Journal of Photopolymer Science and Technology
Online ISSN : 1349-6336
Print ISSN : 0914-9244
ISSN-L : 0914-9244
Photosensitive Sulfonated Polyimides utilizing Alkaline-developable Negative-tone Reaction Development Patterning
Aya Kasahara, Akio Takahashi, Toshiyuki Oyama
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Keywords: Negative-tone reaction development patterning, Sulfonated polyimide, Alkaline developer, Photoresist
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2011 Volume 24 Issue 3 Pages 269-272

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© 2011 The Society of Photopolymer Science and Technology (SPST)
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