Directed Self-assembly with Density Mmultiplication of Cage Silsesquioxane-containing Bblock Copolymer via Controlled Solvent Annealing

Journal of Photopolymer Science and Technology

Online ISSN : 1349-6336
Print ISSN : 0914-9244
ISSN-L : 0914-9244

Directed Self-assembly with Density Mmultiplication of Cage Silsesquioxane-containing Bblock Copolymer via Controlled Solvent Annealing

Hiroshi Yoshida, Yasuhiko Tada, Yoshihito Ishida, Teruaki Hayakawa, Mikihito Takenaka, Hirokazu Hasegawa

著者情報

キーワード: Directed self-assembly, Block copolymer, Polyhedral oligomeric silsesquioxane, solvent annealing

ジャーナルフリー

2011 年 24 巻 5 号 p. 577-580

DOI https://doi.org/10.2494/photopolymer.24.577

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© 2011 The Society of Photopolymer Science and Technology (SPST)

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