Journal of Photopolymer Science and Technology
Online ISSN : 1349-6336
Print ISSN : 0914-9244
ISSN-L : 0914-9244
1
Nanoporous Structure Fabrication in Selective Areas by Block Copolymer Self-Assembly and Electron Beam Lithography
Hiroyuki Suzuki, Reo Kometani, Sunao Ishihara, Shinichi Warisawa
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Keywords: block copolymer self-assembly, electron beam lithography, selective patterning, nanoporous structure
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2012 Volume 25 Issue 1 Pages 33-36

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© 2012 The Society of Photopolymer Science and Technology (SPST)
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