Study on Curing Characteristic of UV Nanoimprint Resist

Ryusuke Suzuki; Nobuji Sakai; Takeshi Ohsaki; Atsushi Sekiguchi; Hiroyuki Kawata; Yoshihiko Hirai

doi:10.2494/photopolymer.25.211

Ryusuke Suzuki, Nobuji Sakai, Takeshi Ohsaki, Atsushi Sekiguchi, Hiroyuki Kawata, Yoshihiko Hirai

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Keywords: Nanoimprint, Resist, Fluoropolymers, UV-NIL, UV nanoimprint, UV curable resist, conversion, polymerization, time constant, modulus

JOURNAL FREE ACCESS

2012 Volume 25 Issue 2 Pages 211-216

DOI https://doi.org/10.2494/photopolymer.25.211

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Abstract

Photo polymerization characteristics of UV curable resist in UV nanoimprint lithography are studied on monomer conversion ratio. The monomer conversion ratio is measured by Fourier Transform Infrared Spectroscopy (FT-IR) and polymerization velocity is theoretically investigated. The relation between monomer conversion ratio and UV intensity is investigated. Also, dependence of polymerization velocity on resist thickness is discussed. Monomer conversion rate is related to the product of square root of the UV intensity and exposure time. The reaction speed decreases in thin films.

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