Filterability of Block Copolymer Solutions used for Directed Self Assembly Lithography

抄録

In order to study the filterability of block copolymer solutions (BCP) with 2 nm to 20 nm rated lithography process filters, the determination of hydrodynamic diameter by dynamic light scattering (DLS), block copolymer concentration determination using UV-Vis spectroscopy and molecular weight distribution measurement using gel permeation chromatography (GPC) were conducted. Hydrodynamic diameters by DLS were sufficiently small and this indicates filtration is feasible. And consistency of BCP concentration by UV-Vis spectroscopy and molecular weight distribution by GPC confirmed that HDPE 5, 2 nm rated filters and Nylon 6,6 20, 10 nm rated filters provided desired filtration without sacrificing critical performance of BCP solution. Based on the results, these filters are recommended for defect reduction in DSAL process which provides 1X nm patterns.