2014 Volume 27 Issue 1 Pages 117-120
We evaluated the effect of DSN4034 (fluorosurfactant) to carry out ASL free UV nanoimprinting. The water contact angle of C-TGC-02 (UV nanoimprint resin) with DSN4034 decreased with increase in additive amount of DSN4034. We assumed that this phenomenon was caused by large amount of PEO chain and OH group in DSN4034. However, it is necessary to investigate the phenomenon by X-ray photoelectron spectroscopy and atomic force microscopy. When both the mold and the substrate were the equivalent hydrophilic surface treated by O2 RIE, the resin was peeled from the substrate. By putting the difference of interface between the mold and the substrate, we succeeded ASL free UV nanoimprinting.
