Journal of Photopolymer Science and Technology
Online ISSN : 1349-6336
Print ISSN : 0914-9244
ISSN-L : 0914-9244
Multicomponent Systems of Dendritic Thiol-ene Photopolymers for Preferable UV Curing
Ken’ichi AokiMasatsugu YamadaRyota ImanishiKunihiro Ichimura
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2015 Volume 28 Issue 1 Pages 43-44

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Abstract
The results serves actual benefit that the viscosities of the resins can be easily adjustable by the adequate choice of the mixing ratios. The critical area to cause drastic change in photosensitivity is in a range of Xw from 0.35 to 0.60, which corresponds to 0.77 - 0.90 of the molar fraction of AL4 (Xm), or 0.45 - 0.69 of the molar fraction of allyl groups of AL4 (Xm’). It should be worth noting that in the shaded area, almost equal amounts of allyl groups are provided from both of the ene compounds of the AL16 (dendrimer) and the AL4 (reactive diluent). Detailed mechanism is under investigation.
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© 2015 The Society of Photopolymer Science and Technology (SPST)
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