Abstract
The Photopolymer Science and Technology Award No. 152100, the Best Paper Award 2015, was presented to Dustin W. Janesa, Takejiro Inoueb,c, Bradley D. McCoya, Ishita Madana, Paul F. Nealeyb, C. Grant Willsona,d, and Christopher J. Ellisona (aMcKetta Department of Chemical Engineering, The University of Texas at Austin, bInstitute for Molecular Engineering, The University of Chicago, cElectronic and Imaging Material Research Laboratories, Toray Industries Inc., dDepartment of Chemistry, The University of Texas at Austin) for their outstanding contribution published in Journal of Photopolymer Science and Technology, 27, (2014) 435-440, entitled “Photochemical Reactions for Replicating and Aligning Block Copolymer Thin Film Patterns”.