抄録
We have succeeded in development of alkalisoluble oligo-ladder phenylsilsesquioxane (oligo-LPSQ). Oligo-LPSQ was synthesized by the one-pot manner via silicon-pyridine adducts formation at aqueous-liquid boundary and finally product was obtained as white solid (85% yield) through re-precipitation in n-hexane. The obtained polymer is soluble in 2.38% TMAH (tetramethylammonium hydride). This polymer was characterized by MALDI-TOF/TOF-MS and 29SiNMR techniques. The properties of obtained polymer showed high thermal resistance over 400 °C and low dielectric constant under 3.2. Furthermore, the alkali soluble oligo-LPSQ can provide both positive and negative tone photosensitive LPSQ combination with diazonaphtoquinone (DNQ) and photo-acid (base) generator, respectively. Here we demonstrate features of synthesis method for alkali-soluble oligo-LPSQ, photolithographic character and the material properties.
