Enhancement of Photoresist Removal Rate by Using Atomic Hydrogen Generated under Low-pressure Conditions

Abstract

Instead of photoresist removal methods using chemicals, we investigated a novel, environmentally friendly removal method using atomic hydrogen generated on a tungsten hot-wire catalyst. We revealed that the photoresist removal rate is remarkably enhanced under low hydrogen pressure conditions. This enhancement may be ascribed to the high kinetic energy of H atoms. If we optimize the removal conditions, the removal rate may become comparable to that achieved when chemicals are used.