The Photopolymer Science and Technology Award

Abstract

The Photopolymer Science and Technology Award No. 160200, the Best Paper Award 2016, was presented to Hiroki Takano^a, Lei Wang^a, Yuki Tanaka^a, Rina Maeda^a, Naoko Kihara^b, Yuriko Seino^b, Hironobu Sato^b, Yoshiaki Kawamonzen^b, Ken Miyagi^b, Shinya Minegishi^b, Tsukasa Azuma^b, Christopher K. Ober^c, and Teruaki Hayakawa^a (^aDepartment of Organic and Polymeric Materials, Tokyo Institute of Technology, ^bEUVL Infrastructure Development Center, Inc, ^cMaterials Science & Engineering, Cornell University) for their outstanding contribution published in Journal of Photopolymer Science and Technology, 28, (2015) 649-652, entitled "Vertical Oriented Lamellar Formation of Fluorine- and Silicon-containing Block Copolymers without Neutral Layers".