Synthesis of Polynorbornene Dendrimers to Apply to Thiol-ene Photopolymers with Excellent Photosensitivity

Abstract

In this paper, we focus on novel types of dendritic polynorbornenes because norbornene is regarded as one of the most promising ene units in thiol-ene chemistry because of its enhanced ability to activate carbon radicals due to the distorted structures. We describe here the effect of the norbornene units located at the outermost position of the dendrimers on the photosensitivity of the thiol-ene UV curable materials.