Abstract
Anti-sticking treatment of the mold is crucial to improve pattern transferring fidelity in nano-imprint lithography. It is an important issue to investigate the effects of the antisticking layer on pattern transferring while considering the actual effectiveness of the antisticking layer after mold is used repeatedly. In this paper, contact separating between mold and polymer under different adhesion force conditions was investigated. According to displacement nephograms of polymer in different demolding stages and the relationship curves between demolding force and demolding displacement, the development of polymer deformation was compared and analyzed. The effect of increasing adhesion force on demolding force and pattern maximum stretch was studied. It is shown that complete failure of antisticking layer at the top would increase the second peak value of demolding force and stretch deformation of polymer pattern, accompanied by severe necking phenomenon. After complete separation of the lateral contact at the top, imprinted polymer patterns have obvious deformation. It is found that the second peak value of demolding force and polymer pattern maximum stretch have linear relationship with decreasing antisticking layer effectiveness at the top.
