Journal of Photopolymer Science and Technology
Online ISSN : 1349-6336
Print ISSN : 0914-9244
ISSN-L : 0914-9244
Development of Novel Low-temperature Curable Positive-Tone Photosensitive Polyimide with High Elongation
Yu ShojiYutaro KoyamaYuki MasudaKeika HashimotoKimio IsobeRyoji Okuda
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2016 Volume 29 Issue 2 Pages 277-282

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Abstract

Recently, progress of semiconductor packaging is drastic and multi-pinned devices such as Fan-out Wafer Level Packages (FOWLPs) attract much attention. For those applications, photosensitive polyimides (PSPIs) are applied as re-distribution layers (RDLs) and they are required to have high level of properties such as adhesion to metal and reliability. We developed novel low-temperature curable positive-tone photosensitive polyimides (posi-PSPIs) with high elongation, strong adhesion to the copper RDLs, and high chemical resistance for establishing the multi RDLs by improving the base-polyimides and incorporating polyimides with cross-linkers and adhesion promoters.

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© 2016 The Society of Photopolymer Science and Technology (SPST)
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