Directed Self-Assembly Materials for High Resolution beyond PS-b-PMMA

抄録

To extend directed self-assembly (DSA) of poly(styrene-block-methyl methacrylate), PS-b-PMMA, for higher resolution and potentially improving pattern line edge roughness (LER) and placement accuracy, we have developed a next generation material platform of organic high-χ block copolymers ("HC series", AZEMBLY^TM EXP PME-3000 series). The polymer platform has a built-in orientation control mechanism which results in convenient morphology orientation control without involving topcoat/additive or delicate solvent vapor annealing. Sub-10 nm node lines and spaces (L/S) patterning with two major chemoepitaxy DSA, LiNe and SMART^TM processes, was successfully implemented on 300 mm wafer substrates using the PME-3000 lamellar series.