Journal of Photopolymer Science and Technology
Online ISSN : 1349-6336
Print ISSN : 0914-9244
ISSN-L : 0914-9244
EUV Mechanistic Studies of Antimony Resists
Michael MurphyAmrit NarasimhanSteven GrzeskowiakJacob SitterlyPhilip SchulerJeff RichardsGreg DenbeauxRobert L. Brainard
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2017 Volume 30 Issue 1 Pages 121-131

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Abstract
We have developed a method to study the photomechanism of our antimony carboxylate platform Ph3Sb(O2CR')2. A series of mechanistic studies followed the production of reaction byproducts by mass spectrometer, as they leave the film during exposure to EUV photons or 80 eV electrons. The major volatile products are CO2, benzene and phenol. The rate of outgassing is well-correlated with the reaction energy of decarboxylation of the carboxylate ligand as determined by density functional theory. Additionally, a deuterium labeling study was conducted to determine the source of hydrogen needed to convert phenyl and phenoxy to benzene and phenol. Specifically, EUV exposure of Ph3Sb(O2CCD3)2 creates d0-benzene and d1-phenol with >95% isotopic purity. Several mechanistic pathways are proposed and discussed.
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© 2017 The Society of Photopolymer Science and Technology (SPST)
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