Surface Fabrication of Block Copolymer-Templated Polyimide Films by Reactive Ion Etching

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In this study, we demonstrated fabrication of polyimide composite films with periodic nanostructure on the surface by oxygen plasma reactive ion etching (RIE). Poly(2-vinylpyridine)-block-poly(methyl methacrylate) (P2VP-b-PMMA) was used as a template for formation of periodic nanostructure. The templating block copolymer formed self-assembled structure including the poly(amic acid) (PAA), as a precursor of polyimide, in only the P2VP domain. After the imidization of PAA, PMMA domain was etched selectively by RIE. Thereby, well-ordered hexagonally-packed pores with a d-spacing of approx. 50 nm and a diameter of approx. 25 nm were obtained on the surface of the film.