Journal of Photopolymer Science and Technology
Online ISSN : 1349-6336
Print ISSN : 0914-9244
ISSN-L : 0914-9244
Printing of Lenticular Lens Patterns Using Defocused Projection Lithography
Hiroshi KobayashiYuta MorizaneToshiyuki Horiuchi
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2018 Volume 31 Issue 1 Pages 45-50

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Abstract
A new optical lithography method for fabricating humpbacked pattern arrays was developed. The patterns were printed by adopting intentionally defocused projection exposure under the condition of very low numerical aperture of 0.089. As a resist, approximately 100-μm thick SU-8 (MicroChem) was used, and appropriate defocuses were 1400-2000 μm. When the exposure time and the defocus were changed, curvature radii of lens patterns were controllable in a wide range of 70-300 μm. The curvature radius became large when the exposure time was extended, and the defocus was reduced. The patterns will be usable as original molds of lenticular lens arrays. In addition, the patterns will also be usable as temporal lenticular lens arrays as they are, because the SU-8 is almost transparent for visible light.
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© 2018 The Society of Photopolymer Science and Technology (SPST)
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