Computational Study of Pattern Formationin UV Nanoimprint Lithography

Abstract

We have investigated the pattern formation process in ultraviolet (UV) nanoimprint lithography by stochastic and molecular dynamics (MD) simulations. The UV-curing process was investigated by stochastic simulations. The simulations show the polymerization process of UV-cured molecules. The effect of the photoinitiator concentration of the UV-cured resist was also investigated by stochastic simulations. The sizes and shapes of the reacted monomers in UV-cured resists with various molecular weights were also shown. The de-molding process was investigated by MD simulations. For a resist with a relatively low molecular weight, fracture and stretching of the pattern are observed during the de-molding process.