Journal of Photopolymer Science and Technology
Online ISSN : 1349-6336
Print ISSN : 0914-9244
ISSN-L : 0914-9244
Time-resolved Analysis of Resist Stripping Phenomenon Using Laser Irradiation
Tomosumi KamimuraYuji UmedaHiroyuki KuramaeKosuke NunoRyosuke NakamuraHideo Horibe
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2018 Volume 31 Issue 3 Pages 413-418


Resist stripping phenomenon with laser irradiation was observed by using a time-resolved analysis. The time change of the resist stripping phenomenon by a probe laser irradiation was observed from the viewpoint of the intensity change of the probe laser. As for the laser irradiation in the water, the probe laser intensity arrived at the maximum after around 40 μs. During the pump laser irradiation of 8 ns, a large compressive stress of -10 MPa was confirmed inside the resist from the FE analysis results. The generation of this compression stress is important for starting the resist stripping process, and is thought to improve the resist removal efficiency.

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© 2018 The Society of Photopolymer Science and Technology (SPST)
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