Journal of Photopolymer Science and Technology
Online ISSN : 1349-6336
Print ISSN : 0914-9244
ISSN-L : 0914-9244
The Photopolymer Science and Technology Award
Robert D. Allen
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Keywords: The Photopolymer Science and Technology Award, The Outstanding Achievement Award, Water immersion ArF lithography
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2019 Volume 32 Issue 1 Pages 3-5

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Abstract

The Photopolymer Science and Technology Award No. 191100, the Outstanding Achievement Award 2019 was presented to Dr. Robert D. Allen (IBM Research, Almaden) for his outstanding achievements in photopolymer science and technology, “Pioneering semiconductor patterning technology using water immersion ArF lithography with the originally designed photoresist”.

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© 2019 The Society of Photopolymer Science and Technology (SPST)
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