Metal Organic Cluster Photoresists for EUV Lithography

Kazunori Sakai; Seok Heon Jung; Wenyang Pan; Emmanuel P. Giannelis; Christopher K. Ober

doi:10.2494/photopolymer.32.711

Kazunori Sakai, Seok Heon Jung, Wenyang Pan, Emmanuel P. Giannelis, Christopher K. Ober

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Keywords: EUV lithography, EUV photoresist, Metal oxide resist, Metal organic cluster photoresist

JOURNAL FREE ACCESS

2019 Volume 32 Issue 5 Pages 711-714

DOI https://doi.org/10.2494/photopolymer.32.711

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Abstract

Extreme ultraviolet (EUV) lithography is a prominent candidate for printing under 10nm half pitch patterns. Recently, we have developed metal organic cluster resists possessing higher EUV absorbing elements and controlled molecular size and distribution. Here, we report lithographic performance of zirconium organic cluster and zinc organic luster resists. EUV exposure results for the zinc organic cluster resists on different underlayers are also discussed.

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