Journal of Photopolymer Science and Technology
Online ISSN : 1349-6336
Print ISSN : 0914-9244
ISSN-L : 0914-9244
Multi-Level Nanoimprint Lithography for Large-Area Thin Film Transistor Backplane Manufacturing
Tamer DoganJoris de RietThijs BelRoy VerbeekIlias KatsourasEric MeulenkampGerwin GelinckAuke Jisk Kronemeijer
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2020 Volume 33 Issue 2 Pages 241-244


Thin film transistors (TFTs) are the basis for current AMOLED display arrays. For next- generation displays, higher resolution and cost-effective manufacturing of panels is adamant. The current benchmark patterning method in the display industry is photolithography. Here, we propose the use of a hybrid approach of nanoimprint lithography and conventional FPD processing for the realization of high-resolution display backplanes. We demonstrate the realization of sub-micron amorphous oxide semiconductor TFTs with multi-level nanoimprint lithography in order to decrease the number of patterning steps in display manufacturing. Top-gate self-aligned a-IGZO TFTs are realized with performance comparable to benchmark photolithography-based TFTs.

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© 2020 The Society of Photopolymer Science and Technology (SPST)
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