Micropatterning Performance and Physical Characteristics of Water-soluble High Molecular Weight Polysaccharide Photoresist Materials

Abstract

Pullulan, a base polymer, is a water-soluble high-molecular-weight polysaccharide that easily forms films and is used for edible films and the like. We examined whether a photoresist material that makes the best use of its film-forming property and water solubility could be realized. The hydroxyl group of pullulan was modified with a photosensitive group to the extent that water solubility could be maintained, and a photosensitive material was created. This material is applied on a silicon wafer using spin coating, exposed with a mask contact exposure device, and then developed with water to evaluate sensitivity, etching resistance, and coating film strength. Microfabrication evaluation was performed. The result may be applicable as a water-soluble micropatterning material. Because this material does not use an organic solvent or a highly toxic strong alkaline developer, it is useful as a low environmental load-patterning material.