Fabrication of SiO:CH Particle-agglomerated Films by PECVD with Vinyl-group Organosilicon Reactants

抄録

Particle-agglomerated films exhibit rough surfaces, which can be suitable for realization of ultra hydrophobicity. We fabricated particles and their deposits of silica with organic functional groups (SiO:CH) by plasma polymerization of organosilicon reactants including methyl and vinyl functional groups. The trimethyl(vinyl)silane reactant showed a uniform deposition of the plasma-polymerized SiO:CH particles in a large area, while the trimethyl (vinyloxy)silane exhibited a localized particle deposition.