Study of Dihedral-Corner-Reflector-Array Fabrication Process Using Soft X-ray Deep X-ray Lithography

Taki Watanabe; Sho Amano; Shinya Izawa; Satoshi Maekawa; Keisuke Yoshiki; Akinobu Yamaguchi; Yuichi Utsumi

doi:10.2494/photopolymer.36.97

Taki Watanabe , Sho Amano, Shinya Izawa, Satoshi Maekawa, Keisuke Yoshiki, Akinobu Yamaguchi, Yuichi Utsumi

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Keywords: Synchrotron radiation, X-ray, LIGA, Microfabrication, DCRA

JOURNAL FREE ACCESS

2023 Volume 36 Issue 2 Pages 97-100

DOI https://doi.org/10.2494/photopolymer.36.97

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Abstract

We fabricated sectoral-pillar structures for Dihedral Corner Reflector Array (DCRA) using Deep X-ray Lithography (DXRL) in New SUBARU Synchrotron Radiation Facility. We studied process conditions such as a start timing of development after exposure and development temperature. We succeeded in fabricating a structure without of micro-cracks on sidewalls of the pillar and in demonstration of floating image using the fabricated DCRA.

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