The Impact of (Poly)glycerol in Developer on the Dissolution and Sensitivity of Positive-tone Photosensitive Polyimides

Abstract

In the process of manufacturing semiconductor devices, lithography process is repeated. Photoresist applied to circuit formation. In previous reported study, we found that adding Glycerol into the alkali developer, TMAH 2.38% aq., enables to improve resolution in lithography of novolak type resist due to control the resist solubility. However, it is uncertain whether different structure photoresist would produce the above-mentioned performance same as well. Photosensitive Polyimides has good thermal stability, mechanical and electronic properties. Therefore, its resist is widely used for as protection layer, interlayer dielectrics, and re-distribution layer. In this study, we evaluated the effect of resolution on positive-tone photosensitive polyimides by adding Glycerol into alkali developer. As the result, dissolution of unexposed resist was inhibited and the resist sensitivity was improved through the controlling of development time, respectively.