Synthesis of Sulfur-Containing High Refractive Index Polymers at Room Temperature and The Application in Lithography

Abstract

Sulfur-containing polymers are widely used in the AR/VR industry due to their high refractive index. In this study, we synthesized sulfur-containing polymethacrylates at room temperature by using sulfur with the methacrylate monomer. The resulting polymer was used as a photoresist, incorporating 6% weight of a photoacid generator. The exposure process was carried out under a 254 nm UV lamp, demonstrating good lithographic properties.